EVGroup - Press Release
Fraunhofer IOF selects EV Group UV-Nanoimprint Lithography (UV-NIL) System for Leading-Edge applied Optoelectronics R&D
EV Group (EVG) announced that Fraunhofer Institute for Applied Optics and Precision Engineering IOF-one of 57 institutes of the Fraunhofer-Gesellschaft dedicated to applied optics and precision applications-oriented research-selected EVG's UV-based nanoimprint lithography (UV-NIL) step and repeat system for its leading-edge optoelectronic research efforts. The Institute will be using the UV-NIL stepper for micro-lens mastering and molding for a host of micro-optics applications, including fiber optics and CMOS image sensors for wafer-level cameras, as well as for other nanoimprinting applications.
EVG's unique step and repeat imprinting approach integrates a lens master generation capability, which augments traditional single-step processes. This added capability enables the creation of a lens master for working stamp fabrication and subsequent full-wafer lens micro-molding. The system also offers significant cost-savings advantages, particularly compared to traditional lens master fabrication techniques, including the elimination of post-processing steps, the flexibility to use a variety of commercially available resists, and increased throughput. Pulling from its expertise in alignment systems, EVG's UV-NIL stepper features sub-micron alignment accuracy, resulting in improved yield as well as device performance.
More information at www.evgroup.com
